Researchers Created Photoreversible Protective Films
New acrylate-based materials allow for high-resolution surface protection that degrades on demand via light exposure.
Updated on Oct. 14, 2026 in Chemistry
Researchers at EPFL have developed a protective film that uses light for both application and removal. The material is designed for precision, achieving high-resolution patterns via aerosol jet printing.
Why it matters
Current functional coatings often suffer from poor printability or difficult removal processes, leaving surfaces vulnerable during manufacturing. This research-stage development offers a method to selectively apply and strip protective layers using controlled light wavelengths.
The films demonstrate a fracture energy of 3.9 x 10 J.m with a polyethyleneimine-based adhesion promoter, marking a 3.25x improvement over films lacking the additive. The material achieves a feature resolution of less than 30 micrometers.
The players
EPFL
A Swiss federal institute of technology known for research in microengineering, chemistry, and materials science.
The details
The material relies on an acrylate-based polymer cured with 405 nm light over 120 seconds. Once applied, the film can be removed through photodegradation, a process where chemical bonds break upon exposure to 365 nm light. Adhesion is reinforced by incorporating Lupasol WF, a polyethyleneimine-based polymer, which increases the film's structural toughness during industrial handling.
Timeline
The research article was published in Macromolecular Rapid Communications on 2026-10-14.
The Tech Race
This development follows a pattern of innovation established by the EPFL materials science research program. It marks a shift toward reversible, light-responsive materials that compete with traditional masking agents in high-precision manufacturing.
This technology remains in the research phase and is not yet available for commercial manufacturing workflows. Its eventual adoption depends on the integration of aerosol jet printing systems capable of managing the required light-curing wavelengths.
The takeaway
This development provides a pathway to reversible surface protection that could replace permanent masking materials. Researchers should monitor future publications for scalability testing of the material on complex substrates.
Further reading
For broader trends in chemical engineering and material design, visit the Chemistry section.
Source note: This article includes information reported by Swiss Federal Institute of Technology, Lausanne (EPFL).
