New Centra Smart Hub Boosts Wafer Measurement Accuracy
The system improves thermal tracking by 40% by eliminating signal interference from heating lamps during chip manufacturing.
Updated on Oct. 29, 2026 in Semiconductors
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Advanced Energy has launched the Centra Smart Hub, a new wafer temperature measurement system designed for semiconductor manufacturing. The system, which has now officially shipped, uses specialized sensor arrays to improve thermal tracking accuracy.
Why it matters
The technology addresses a persistent issue in chip manufacturing where infrared heating lamps cause signal interference for standard monitoring tools. By overcoming this, the system allows for more precise thermal control during high-temperature processing.
The system features a hub-and-spoke architecture that measures temperatures up to 1700°C. It utilizes specific operating wavelengths of 3.3µm or 5.2µm to avoid interference, marking a 40% gain in accuracy compared to conventional solutions.
The players
Advanced Energy
A designer and manufacturer of precision power conversion, measurement, and control solutions for semiconductor and industrial markets.
The details
The Centra Smart Hub manages remote sensors mounted directly onto semiconductor process chambers, with the hub itself residing in an instrumentation rack. It uses targeted infrared wavelengths of 3.3µm or 5.2µm to isolate temperature readings from the IR heating lamps typically found in fabrication equipment. The system utilizes EtherCAT and Ethernet protocols for data connectivity while supporting sensor ambient temperatures up to 60°C.
Timeline
Advanced Energy announced the system launch on October 29, 2026.
The Tech Race
This development marks a shift away from traditional infrared pyrometers that struggle with thermal lamp interference. It places Advanced Energy at the forefront of high-temperature precision monitoring in modern fabrication environments.
The system is now available for deployment in semiconductor manufacturing facilities that require high-precision thermal monitoring. Operators can integrate the hardware via standard Ethernet or EtherCAT connections to update legacy processing workflows.
The takeaway
This platform provides a path to higher yields in thermal-sensitive fabrication processes. Engineers should watch for third-party benchmarking results to confirm if the 40% accuracy improvement holds across different chamber configurations.
Further reading
For more on the current state of industrial manufacturing hardware, visit Semiconductors.
Source note: This article includes information reported by Electronics For You - Official Site ElectronicsForU.com.
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